Invention Grant
- Patent Title: Cylindrical germanium nanowire device
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Application No.: US15870253Application Date: 2018-01-12
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Publication No.: US10468505B2Publication Date: 2019-11-05
- Inventor: Deyuan Xiao
- Applicant: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Applicant Address: CN Shanghai
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN Shanghai
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: CN201410421826 20140826
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/78 ; H01L21/02 ; H01L29/786 ; H01L29/775 ; H01L29/423

Abstract:
A semiconductor device includes a substrate, a cavity in the substrate, and a germanium (Ge) nanowire suspending in the cavity.
Public/Granted literature
- US20180138297A1 CYLINDRICAL GERMANIUM NANOWIRE DEVICE Public/Granted day:2018-05-17
Information query
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