Invention Grant
- Patent Title: Image sensor device structure with doping layer in light-sensing region
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Application No.: US15868324Application Date: 2018-01-11
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Publication No.: US10475828B2Publication Date: 2019-11-12
- Inventor: Yen-Ting Chiang , Chun-Yuan Chen , Hsiao-Hui Tseng , Yu-Jen Wang , Shyh-Fann Ting , Wei-Chuang Wu , Jen-Cheng Liu , Dun-Nian Yaung
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0352 ; H01L31/11

Abstract:
An image sensor device structure is provided. The image sensor device structure includes a substrate, and the substrate is doped with a first conductivity type. The image sensor device structure includes a light-sensing region formed in the substrate, and the light-sensing region is doped with a second conductivity type that is different from the first conductivity type. The image sensor device structure further includes a doping region extended into the light-sensing region, and the doping region is doped with the first conductivity type. The image sensor device structure also includes a plurality of color filters formed on the doping region.
Public/Granted literature
- US20190157319A1 IMAGE SENSOR DEVICE STRUCTURE WITH DOPING LAYER IN LIGHT-SENSING REGION Public/Granted day:2019-05-23
Information query
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