Invention Grant
- Patent Title: Measurement method comprising in-situ printing of apparatus mark and corresponding apparatus
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Application No.: US16328750Application Date: 2017-08-18
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Publication No.: US10481507B2Publication Date: 2019-11-19
- Inventor: Kevin J. Violette , Igor Matheus Petronella Aarts , Haico Victor Kok , Eric Brian Catey
- Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/070895 WO 20170818
- International Announcement: WO2018/046279 WO 20180315
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
Public/Granted literature
- US20190196341A1 MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AND CORRESPONDING APPARATUS Public/Granted day:2019-06-27
Information query
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