Invention Grant
- Patent Title: Evaluation method, correction method, recording medium and electron beam lithography system
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Application No.: US15978747Application Date: 2018-05-14
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Publication No.: US10483082B2Publication Date: 2019-11-19
- Inventor: Rieko Nishimura
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-230771 20151126; JP2016-172750 20160905
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/09 ; H01J37/317 ; H01J37/304

Abstract:
An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.
Public/Granted literature
- US20180269028A1 EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON BEAM LITHOGRAPHY SYSTEM Public/Granted day:2018-09-20
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