Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15680724Application Date: 2017-08-18
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Publication No.: US10483366B2Publication Date: 2019-11-19
- Inventor: Fujio Masuoka , Hiroki Nakamura
- Applicant: Unisantis Electronics Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: UNISANTIS ELECTRONICS SINGAPORE PTE. LTD.
- Current Assignee: UNISANTIS ELECTRONICS SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Brinks Gilson & Lione
- Priority: WOPCT/JP2014/068707 20140714
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/78 ; H01L29/66 ; H01L29/40 ; H01L21/762 ; H01L27/06 ; H01L21/8238 ; H01L21/822 ; H01L27/092

Abstract:
A semiconductor device includes a third first-conductivity-type semiconductor layer on a semiconductor substrate, and a first pillar-shaped semiconductor layer on the semiconductor substrate. The first pillar-shaped semiconductor layer including a first first-conductivity-type semiconductor layer, a first body region, a second first-conductivity-type semiconductor layer, a first second-conductivity-type semiconductor layer, a second body region, a second second-conductivity-type semiconductor layer, and a third second-conductivity-type semiconductor layer. A first gate insulating film is around the first body region, and a first gate is around the first gate insulating film. A second gate insulating film is around the second body region and a second gate is around the second gate insulating film. An output terminal is connected to the second first-conductivity-type semiconductor layer and the first second-conductivity-type semiconductor layer, and a first contact connects the first gate and the second gate.
Public/Granted literature
- US20170345909A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-11-30
Information query
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