Invention Grant
- Patent Title: Photovoltaic device and method for manufacturing the same
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Application No.: US14380612Application Date: 2012-05-15
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Publication No.: US10483422B2Publication Date: 2019-11-19
- Inventor: Daisuke Sato , Hiroyuki Yaguchi , Shuhei Yagi
- Applicant: Daisuke Sato , Hiroyuki Yaguchi , Shuhei Yagi
- Applicant Address: JP Toyota-shi JP Saitama-shi
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY
- Current Assignee Address: JP Toyota-shi JP Saitama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-042322 20120228
- International Application: PCT/JP2012/062365 WO 20120515
- International Announcement: WO2013/128661 WO 20130906
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L31/0693 ; H01L31/18 ; B82Y20/00

Abstract:
Provided is a photovoltaic device prepared with a semiconductor including a localized level or an intermediate band in a forbidden band and capable of improving the performance than before. The photovoltaic device includes a plurality of first layers made of a first semiconducting material and a plurality of second layers made of a second semiconducting material that is different from the first semiconducting material, wherein the second semiconducting material includes a localized level or intermediate band in a forbidden band, the first layers and the second layers are alternately laminated one by one, at least two of the second layers are each disposed between a pair of the first layers, and a thickness of each of the second layers is thinner than a thickness of four molecular layers of the first semiconducting material.
Public/Granted literature
- US20150287867A1 PHOTOVOLTAIC DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2015-10-08
Information query
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