Invention Grant
- Patent Title: Substrate and method for manufacturing the same
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Application No.: US15712787Application Date: 2017-09-22
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Publication No.: US10485105B2Publication Date: 2019-11-19
- Inventor: Yong Sam Lee , Won Joong Kim
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2017-0021721 20170217
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/00 ; H05K3/42

Abstract:
A substrate including a through hole only in one of a direction from a top surface to a bottom surface of the substrate or a direction from a bottom surface to a top surface of the substrate, a protruding portion of a metal layer protruding toward the through hole being removed, and a plating layer on an inner surface of the substrate on at least the through hole.
Public/Granted literature
- US20180242453A1 SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-08-23
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