Invention Grant
- Patent Title: Mask frame, mask and method for manufacturing the same
-
Application No.: US15574455Application Date: 2017-03-27
-
Publication No.: US10510958B2Publication Date: 2019-12-17
- Inventor: Jian Zhang , Chun Chieh Huang , Fuqiang Tang
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , Ordos Yuansheng Optoelectronics Co., Ltd.
- Applicant Address: CN Beijing CN Ordos, Inner Mongolia
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.,ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Current Assignee Address: CN Beijing CN Ordos, Inner Mongolia
- Agency: Kinney & Lange, P.A.
- Priority: CN201610366372 20160527
- International Application: PCT/CN2017/078269 WO 20170327
- International Announcement: WO2017/202130 WO 20171130
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; C23C16/04 ; C23C14/24 ; H01L51/56

Abstract:
A mask frame, a mask body, a mask and a method for manufacturing the same are provided in the embodiments of the disclosure. The mask frame includes a loop shaped frame body comprising an outer boundary and an inner boundary, the inner boundary defining a space for receiving a mask body. The mask frame also includes a forced side and a non-forced side, the forced side being subjected to a pulling force of the mask body, the non-forced side being free from the force of the mask body. A width between the outer boundary of the forced side of the mask frame and the inner boundary corresponding to the outer boundary decreases gradually in a direction from a middle position on the forced side toward the non-forced side.
Public/Granted literature
- US20180248120A1 MASK FRAME, MASK AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-08-30
Information query
IPC分类: