The present invention discloses a commissioning method and a vapor deposition machine, the method is used for adjusting the relative position of a precision mask plate and a substrate to be operated, which comprises: loading a commissioning substrate into a vapor deposition chamber for commissioning; loading a precision mask plate into the vapor deposition chamber for commissioning; turning on the light source in the vapor deposition chamber for commissioning, and irradiating the photochromic layer on the commissioning substrate via the precision mask plate, wherein a partial position of the irradiated photochromic layer is discolored; obtaining a compensation value of the precision mask plate by the location of a partial discolored position of the photochromic layer. The method is possible to omit the organic materials during the commissioning process, and increase the commissioning speed.