- Patent Title: Purification method for purifying liquid, purification method for purifying silicon compound-containing liquid, method for producing silylating agent liquid, film forming material or diffusing agent composition, filter medium and filter device
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Application No.: US15772931Application Date: 2016-10-28
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Publication No.: US10525418B2Publication Date: 2020-01-07
- Inventor: Yoshihiro Sawada , Tsukasa Sugawara
- Applicant: Tokyo Ohka Kogyo Co., Ltd.
- Applicant Address: JP Kanagawa
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kanagawa
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2015-220512 20151110
- International Application: PCT/JP2016/082140 WO 20161028
- International Announcement: WO2017/082088 WO 20170518
- Main IPC: B01D69/02
- IPC: B01D69/02 ; C08J9/26 ; H01L21/225 ; B01D67/00 ; C07F7/20 ; C07F7/10 ; C07F7/18 ; C09D179/08 ; C08G73/10 ; H01L21/22 ; B01D71/64 ; B01D61/14 ; C08G73/14

Abstract:
To provide: a purification method which uses a polyimide and/or polyamide imide porous membrane that exhibits excellent removal performance for impurities such as metals, and wherein a liquid that is a silylating agent liquid, a film forming material or a diffusing agent composition is an object to be purified; a purification method for purifying a silicon compound-containing liquid that contains a silicon compound which is capable of producing a silanol group by hydrolysis; a method for producing a silylating agent liquid, a film forming material or a diffusing agent composition, which uses the purification method; a filter medium which is composed of the above-described porous membrane; and a filter device which comprises the above-described porous membrane. A purification method for purifying a liquid, which comprises a step in which some or all of the liquid is caused to permeate through a polyimide and/or polyamide imide porous membrane having communicating pores from one side to the other side by means of differential pressure, and wherein the liquid is a silylating agent liquid, a film forming material or a diffusing agent composition that is used for diffusing a dopant into a semiconductor substrate.
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