- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound
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Application No.: US15176762Application Date: 2016-06-08
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Publication No.: US10526266B2Publication Date: 2020-01-07
- Inventor: Natsumi Yokokawa , Hidehiro Mochizuki , Koutarou Takahashi , Shuhei Yamaguchi
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-020781 20140205
- Main IPC: G03F1/50
- IPC: G03F1/50 ; G03F1/76 ; G03F7/004 ; G03F7/038 ; G03F7/32 ; G03F7/20 ; C07C41/09 ; C07C41/22 ; C07C41/14 ; C07C43/178 ; C07D239/10
Abstract:
The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R1 and R6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R2 and R5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R3 and R4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R3 and R4 may be bonded to each other to form a ring.
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