Invention Grant
- Patent Title: Methods, process and fabrication technology for high-efficiency low-cost crystalline silicon solar cells
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Application No.: US14549261Application Date: 2014-11-20
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Publication No.: US10526538B2Publication Date: 2020-01-07
- Inventor: Maria Faur , Horia M. Faur , Mircea Faur
- Applicant: Maria Faur , Horia M. Faur
- Applicant Address: US OH North Olmsted
- Assignee: SPECMAT, Inc.
- Current Assignee: SPECMAT, Inc.
- Current Assignee Address: US OH North Olmsted
- Agent Joseph J. Crimaldi
- Main IPC: C23F1/16
- IPC: C23F1/16 ; C09K13/08 ; H01L31/0216 ; H01L31/0224 ; H01L31/0236 ; H01L31/068 ; H01L31/18 ; H01L31/056

Abstract:
Disclosed is a method, process, solar cell design, and fabrication technology fir high-efficiency, low-cost, crystalline silicon (Si) solar cells including but not restricted to solar grade single crystal Si (c-Si), multi-crystalline Si (mc-Si), poly-Si, and micro-Si solar cells and solar modules. The RTWCG solar cell fabrication technology creates a RTWCG SiOx thin film antireflection coating (ARC) with a graded index of refraction and a selective emitter (SE). The resulting top surface of the SiOx oxide can be textured (TO) concomitant with the growth process or through an additional mild wet chemical step.
Public/Granted literature
- US20150162460A1 METHODS, PROCESS AND FABRICATION TECHNOLOGY FOR HIGH-EFFICIENCY LOW-COST CRYSTALLINE SILICON SOLAR CELLS Public/Granted day:2015-06-11
Information query
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