Invention Grant
- Patent Title: Gas supply unit and thin film deposition apparatus including the same
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Application No.: US15485433Application Date: 2017-04-12
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Publication No.: US10526706B2Publication Date: 2020-01-07
- Inventor: Suk Jin Chung , Jong Cheol Lee , Jae chul Shin , Min Hwa Jung , Jin Pil Heo
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2016-0082310 20160630
- Main IPC: C23C16/458
- IPC: C23C16/458 ; C23C16/455 ; C23C16/44 ; H01L21/687 ; H01L21/02 ; H01J37/32

Abstract:
A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate and arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches alternating with the gas supply regions on the base plate. A distance between opposing surfaces of the base plate increases in a radial direction from a center of the base plate in each of the plurality of sidewall trenches, so each of the plurality of sidewall trenches has a depth that decreases in the radial direction from the center of the base plate.
Public/Granted literature
- US20180002808A1 GAS SUPPLY UNIT AND THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME Public/Granted day:2018-01-04
Information query
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