Invention Grant
- Patent Title: Method for manufacturing silicon carbide single crystal
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Application No.: US15560978Application Date: 2016-03-18
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Publication No.: US10526722B2Publication Date: 2020-01-07
- Inventor: Masashi Nakabayashi , Kiyoshi Kojima , Hiroyuki Deai , Kota Shimomura , Yukio Nagahata
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-060828 20150324
- International Application: PCT/JP2016/058854 WO 20160318
- International Announcement: WO2016/152813 WO 20160929
- Main IPC: C30B23/02
- IPC: C30B23/02 ; C30B23/00 ; C30B29/36 ; H01L21/02

Abstract:
The present invention provides a method of manufacturing by the sublimation-recrystallization method more accurately detecting a thermal state of a starting material in a crucible and enabling control of the growth conditions while manufacturing an SiC single crystal. The method obtains the high frequency current to be supplied through the induction coil by a converter for converting AC current to DC current and an inverter means for converting the DC current output from the converter to a high frequency to obtain a high frequency current, obtains a grasp, in advance, of a relationship between a variation over time of a DC equivalent resistivity (DCV/DCI), calculated from a DC voltage value (DCV) and DC current value (DCI) converted by the converter at the time of growth of the silicon carbide single crystal, and a density of micropipes formed in the grown silicon carbide single crystal, and adjusts at least one of the DCV or DCI at the converter based on the relationship of the DC equivalent resistivity and micropipe density grasped in advance.
Public/Granted literature
- US20180251909A1 METHOD FOR MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL Public/Granted day:2018-09-06
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