- Patent Title: Photosensitive resin composition, polyamide resin, method for producing polyamide resin, compound, method for producing compound, method for producing cured film, and cured film
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Application No.: US15699292Application Date: 2017-09-08
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Publication No.: US10527940B2Publication Date: 2020-01-07
- Inventor: Yoshinori Tadokoro , Dai Shiota
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Priority: JP2016-179000 20160913; JP2017-151972 20170804
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C07C67/08 ; C09D179/08 ; C08G73/14 ; C08G73/10 ; G03F7/037 ; C07C62/38 ; C07C69/757 ; C07D493/10 ; C08G69/26 ; C08G69/28 ; G03F7/16 ; G03F7/20 ; G03F7/30

Abstract:
A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.
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