Invention Grant
- Patent Title: Substrate processing apparatus, processing apparatus, and method for manufacturing device
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Application No.: US16508266Application Date: 2019-07-10
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Publication No.: US10527945B2Publication Date: 2020-01-07
- Inventor: Masaki Kato , Tohru Kiuchi
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2012-069092 20120326; JP2012-255693 20121121
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/16 ; G03F9/00 ; G03F7/24 ; G03F7/42

Abstract:
A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.
Public/Granted literature
- US20190332018A1 SUBSTRATE PROCESSING APPARATUS, PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING DEVICE Public/Granted day:2019-10-31
Information query
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