Invention Grant
- Patent Title: Systems and methods for generating a patterned orthotic device
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Application No.: US14877361Application Date: 2015-10-07
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Publication No.: US10528032B2Publication Date: 2020-01-07
- Inventor: Kegan L. Schouwenburg , Daniel Bersak , Jeff Smith , Ciaran N. Murphy
- Applicant: Aetrex Worldwide, Inc.
- Applicant Address: US NJ Teaneck
- Assignee: Aetrex Worldwide, Inc.
- Current Assignee: Aetrex Worldwide, Inc.
- Current Assignee Address: US NJ Teaneck
- Agency: Lowenstein Sandler LLP
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G05B19/4099 ; A61F5/01 ; B33Y80/00 ; B33Y50/00 ; A61B5/107 ; A61B5/00 ; B29C64/386 ; B33Y50/02 ; B33Y30/00 ; B33Y10/00

Abstract:
A method for generating an orthotic device is disclosed. In one implementation, the method includes generating CAD model data corresponding to an orthotic device to be applied to a body part of a patient. A pattern is mapped to a surface defined by the CAD model data to produce modified CAD model data, the mapped pattern defining a plurality of perforations formed at least partially through the surface. The modified CAD model data is transmitted to a three-dimensional printer. The three-dimensional printer is to produce the orthotic device having the plurality of perforations.
Public/Granted literature
- US20160101572A1 SYSTEMS AND METHODS FOR GENERATING A PATTERNED ORTHOTIC DEVICE Public/Granted day:2016-04-14
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