Invention Grant
- Patent Title: Dielectric film
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Application No.: US15512920Application Date: 2015-09-24
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Publication No.: US10529494B2Publication Date: 2020-01-07
- Inventor: Shinsuke Miyazawa , Ayako Kato
- Applicant: ZEON CORPORATION
- Applicant Address: JP Chiyoda-ku, Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Chiyoda-ku, Tokyo
- Agency: Kenja IP Law PC
- Priority: JP2014-201155 20140930
- International Application: PCT/JP2015/076945 WO 20150924
- International Announcement: WO2016/052303 WO 20160407
- Main IPC: H01G4/33
- IPC: H01G4/33 ; B32B15/08 ; B29C55/14 ; H01G4/18 ; B29K45/00 ; B29L31/34

Abstract:
The present invention is a film capacitor comprising a dielectric film and a metal layer, the dielectric film being a resin film obtained by stretching an unstretched film produced using a crystalline hydrogenated dicyclopentadiene ring-opening polymer, and heating the resulting stretched film, and the resin film having a softening point of 250 to 320° C., a thermal shrinkage ratio of 0.01 to 5.0% when heated at 200° C. for 10 minutes, a loss tangent (tan δ) of 0.0001 to 0.0010, and a coefficient of static friction of 0.01 to 1.00. The present invention provides a film capacitor that includes a resin film as a dielectric film, the resin film exhibiting excellent heat resistance, excellent withstand voltage properties, and excellent workability.
Public/Granted literature
- US20170301473A1 FILM CAPACITOR Public/Granted day:2017-10-19
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