- Patent Title: Systems and methods for UV-based suppression of plasma instability
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Application No.: US16167382Application Date: 2018-10-22
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Publication No.: US10529557B2Publication Date: 2020-01-07
- Inventor: Shankar Swaminathan
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/40 ; C23C16/505 ; C23C16/56 ; C23C16/509

Abstract:
A substrate is positioned in exposure to a plasma generation region within a plasma processing chamber. A first plasma is generated within the plasma generation region. The first plasma is configured to cause deposition of a film on the substrate until the film deposited on the substrate reaches a threshold film thickness. The substrate is then exposed to ultraviolet radiation to resolve defects within the film deposited on the substrate. The ultraviolet radiation can be supplied in-situ using either a second plasma configured to generate ultraviolet radiation or an ultraviolet irradiation device disposed in exposure to the plasma generation region. The ultraviolet radiation can also be supplied ex-situ by moving the substrate to an ultraviolet irradiation device separate from the plasma processing chamber. The substrate can be exposed to the ultraviolet radiation in a repeated manner to resolve defects within the deposited film as the film thickness increases.
Public/Granted literature
- US20190057864A1 Systems and Methods for UV-Based Suppression of Plasma Instability Public/Granted day:2019-02-21
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