A display panel and a manufacturing method of a display panel are provided. The manufacturing method of a display panel includes: forming the nanoporous silicon oxide material on a substrate to form a nanoporous silicon oxide layer; forming the amorphous silicon material on the nanoporous silicon oxide layer to form an amorphous silicon layer; irradiating the amorphous silicon layer by a laser to crystallize the amorphous silicon layer to form a polycrystalline silicon layer; forming the gate oxide material on the polycrystalline silicon layer to form a gate oxide layer.