Invention Grant
- Patent Title: Device for treating substrates
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Application No.: US15533173Application Date: 2015-12-03
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Publication No.: US10529606B2Publication Date: 2020-01-07
- Inventor: Stefan-Heinrich Hansen , Markus Uihlein , Bernd-Uwe Sander , Stephan Alexis Pediaditakis
- Applicant: RENA TECHNOLOGIES GMBH
- Applicant Address: DE Guetenbach
- Assignee: RENA Technologies GmbH
- Current Assignee: RENA Technologies GmbH
- Current Assignee Address: DE Guetenbach
- Agent Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- Priority: DE102014118039 20141205
- International Application: PCT/DE2015/100517 WO 20151203
- International Announcement: WO2016/086924 WO 20160609
- Main IPC: H01L21/677
- IPC: H01L21/677

Abstract:
A device treats substrates with a liquid, which device has a conveying device by which the substrates can be conveyed in a conveying direction through a container containing a liquid. A weir has an edge over which the substrates can run and which, at least in sections, extends obliquely relative to the conveying direction of the substrates. The weir is used in the device for treating substrates with a liquid. The weir has at least one edge which extends obliquely at least in sections.
Public/Granted literature
- US20170345697A1 DEVICE FOR TREATING SUBSTRATES Public/Granted day:2017-11-30
Information query
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