Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US15758381Application Date: 2016-09-20
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Publication No.: US10529643B2Publication Date: 2020-01-07
- Inventor: Kei Yamamoto , Hodaka Rokubuichi , Dai Nakajima , Kiyofumi Kitai , Yoichi Goto
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Chiyoda-ku
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2015-190885 20150929
- International Application: PCT/JP2016/077680 WO 20160920
- International Announcement: WO2017/057093 WO 20170406
- Main IPC: H01L23/34
- IPC: H01L23/34 ; H01L23/367 ; H01L23/373 ; H01L21/56 ; H01L21/48 ; H01L23/00 ; H01L25/07 ; H01L25/00 ; H01L23/31

Abstract:
A semiconductor device that reduces the deformation of a metal base due to pressure during transfer molding, to thereby suppress the occurrence of cracks in an insulating layer to achieve high electrical reliability. The semiconductor device includes: a metal member provided, on its lower surface, with a projection and a depression, and a projecting peripheral portion surrounding the projection and the depression and having a height greater than or equal to a height of the projection of the projection and the depression; an insulating layer formed on an upper surface of the metal member; a metal layer formed on an upper surface of the insulating layer; a semiconductor element joined to an upper surface of the metal layer; and a sealing resin to seal the semiconductor element, the metal layer, the insulating layer and the metal member.
Public/Granted literature
- US20180261520A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-09-13
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