Invention Grant
- Patent Title: Multilayer inductor and the fabrication method thereof
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Application No.: US15585168Application Date: 2017-05-03
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Publication No.: US10529661B2Publication Date: 2020-01-07
- Inventor: Chih Hung Wei
- Applicant: CYNTEC CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: CYNTEC CO., LTD
- Current Assignee: CYNTEC CO., LTD
- Current Assignee Address: TW Hsinchu
- Agency: Litron Patent & Trademark Office
- Agent Min-Lee Teng
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01F17/00 ; H01F27/34 ; H01L49/02 ; H01L21/302
Abstract:
A conductive element made of magnetic layers each being made of a first magnetic material, a trench is formed in each of the magnetic layer with the bottom surface of the trench being located higher than the bottom surface of the magnetic layer, wherein a second material is disposed in the trench and a conductive layer is disposed over the trench for forming the conductive element.
Public/Granted literature
- US20170323851A1 MULTILAYER INDUCTOR AND THE FABRICATION METHOD THEREOF Public/Granted day:2017-11-09
Information query
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