Invention Grant
- Patent Title: High voltage Schottky diode and manufacturing method thereof
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Application No.: US15803742Application Date: 2017-11-04
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Publication No.: US10529819B2Publication Date: 2020-01-07
- Inventor: Namchil Mun , Shiang Yang Ong , Jeoung Mo Koo , Raj Verma Purakh
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Thompson Hine LLP
- Agent Anthony Canale
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/872 ; H01L29/06 ; H01L29/40

Abstract:
The present invention discloses a Schottky diode. The Schottky diode comprises a substrate having a device well. A drift region is disposed within the device well. A guard ring region is disposed within the device well and adjacent to the drift region. A field isolation region and a dielectric film are disposed on a top substrate surface. The dielectric film is aligned to the field isolation region. A field plate is disposed over the field isolation region and the dielectric film. The field plate completely covers a top surface of the dielectric film and partially overlaps the guard ring region. A conductive contact layer is disposed adjacent to the dielectric film. The conductive contact layer contacts a portion of the device well to define a Schottky diode interface.
Public/Granted literature
- US20190140071A1 HIGH VOLTAGE SCHOTTKY DIODE AND MANUFACTURING METHOD THEREOF Public/Granted day:2019-05-09
Information query
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