Invention Grant
- Patent Title: Domain-specific pattern design
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Application No.: US15802028Application Date: 2017-11-02
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Publication No.: US10530842B2Publication Date: 2020-01-07
- Inventor: Rahul Ghosh , Hugh E. Hockett , Aaron J. Quirk , Lin Sun
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Stephen R. Yoder
- Main IPC: G06F9/455
- IPC: G06F9/455 ; G06F9/445 ; H04L29/08 ; G06F9/44 ; H04L12/24 ; G06F8/61 ; G06F8/10 ; G06F8/20 ; G06F8/71
Abstract:
A method is provided for building patterns with high level pattern topology requirements for deployment across multiple systems. The patterns are built based on pattern capabilities and configurations of the multiple systems. Such patterns can meet the desired pattern capabilities including high availability and/or continuous capabilities.
Public/Granted literature
- US20180124160A1 DOMAIN-SPECIFIC PATTERN DESIGN Public/Granted day:2018-05-03
Information query
