Invention Grant
- Patent Title: Methods and apparatuses for selective chemical etching
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Application No.: US15448794Application Date: 2017-03-03
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Publication No.: US10533134B2Publication Date: 2020-01-14
- Inventor: David S. Nansen , Walter A. Beauchamp , Lee C. Firth
- Applicant: THE BOEING COMPANY
- Applicant Address: US IL Chicago
- Assignee: The Boeing Company
- Current Assignee: The Boeing Company
- Current Assignee Address: US IL Chicago
- Agency: Coats & Bennett, PLLC
- Main IPC: C09K13/00
- IPC: C09K13/00 ; C23F1/02 ; C23F1/04 ; C23F1/08 ; B05C5/00

Abstract:
Methods, apparatuses and systems are disclosed for chemically etching parts by generating an enclosed chemical etching chamber in contact with a part surface and directing a flow of chemical etchant solution in contact with a part region to be etched.
Public/Granted literature
- US20170174987A1 Methods and Apparatuses for Selective Chemical Etching Public/Granted day:2017-06-22
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