Invention Grant
- Patent Title: Gas insensitive mass flow control systems and methods
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Application No.: US16059906Application Date: 2018-08-09
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Publication No.: US10534375B2Publication Date: 2020-01-14
- Inventor: Ryan Johnson , Alexei V. Smirnov , Patrick Albright , Cy Jordan , Arun Nagarajan
- Applicant: Hitachi Metals, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Neugeboren O'Dowd PC
- Main IPC: G05D7/06
- IPC: G05D7/06 ; G01F25/00

Abstract:
Mass flow control systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. One mass flow control system includes a primary conduit for directing a flow of a gas and an adjustment system configured to divert a portion of the gas from the primary conduit to a secondary conduit and provide an adjustment signal that changes when a composition of the gas changes. A mass flow controller is operatively coupled to the primary conduit to control a primary flow rate of the gas. The mass flow controller includes a valve to control the primary flow rate of the gas and a control loop configured to receive the adjustment signal and control the valve to provide the primary flow rate of the gas at a set point.
Public/Granted literature
- US20180348798A1 GAS INSENSITIVE MASS FLOW CONTROL SYSTEMS AND METHODS Public/Granted day:2018-12-06
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