Invention Grant
- Patent Title: Particle etching or depositing evolutionary simulation method and device and computer readable medium
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Application No.: US15525209Application Date: 2014-11-13
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Publication No.: US10534874B2Publication Date: 2020-01-14
- Inventor: Yixu Song
- Applicant: Tsinghua University
- Applicant Address: CN Beijing
- Assignee: Tsinghua University
- Current Assignee: Tsinghua University
- Current Assignee Address: CN Beijing
- Agency: IPro, PLLC
- International Application: PCT/CN2014/091040 WO 20141113
- International Announcement: WO2016/074202 WO 20160519
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The present invention provides particle etching or depositing evolutionary simulation method and device. The method comprises: step 1. obtaining an initial profile; step 2. sampling a series of areas for the profile, and performing an evolution process on each of the series of area by using a micro etching or depositing method; step 3. obtaining macro profile evolution parameters based on a micro evolutionary computation result; step 4. performing macro profile evolutionary computation, comprising: performing profile evolutionary computation by using a macro profile evolution method based on the macro evolution parameters; and step 5, judging whether a termination condition is met, if yes, terminating evolution, and if not, repeating the steps 2-4. In the evolutionary simulation method according to embodiments of the present invention, a micro evolution condition is determined by macro computation, meanwhile, the micro evolution result is transferred to a macro process to determine macro evolution parameters, so that macro computation and micro computation are organically coupled, a trans-scale simulation problem is at least partially solved, and the simulation result is more accurate and rapid.
Public/Granted literature
- US20170323034A1 PARTICLE ETCHING OR DEPOSITING EVOLUTIONARY SIMULATION METHOD AND DEVICE AND COMPUTER READABLE MEDIUM Public/Granted day:2017-11-09
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