Invention Grant
- Patent Title: Photocurable composition, method for forming a pattern, and method for producing a photocured product
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Application No.: US15618868Application Date: 2017-06-09
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Publication No.: US10535519B2Publication Date: 2020-01-14
- Inventor: Yohei Murayama , Toshiki Ito , Chieko Mihara , Motoki Okinaka
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Priority: JP2012-026144 20120209
- Main IPC: H01L21/027
- IPC: H01L21/027 ; G03F7/004 ; G03F7/027 ; B82Y15/00 ; B82Y10/00 ; B82Y40/00 ; B29C33/62 ; B29C39/02 ; G03F7/00 ; G03F1/76 ; H01L21/308 ; B29C35/08
Abstract:
It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C2H5O+ ion signal is higher than that of a C3H7O+ ion signal.
Public/Granted literature
- US20170278704A1 PHOTOCURABLE COMPOSITION, METHOD FOR FORMING A PATTERN, AND METHOD FOR PRODUCING A PHOTOCURED PRODUCT Public/Granted day:2017-09-28
Information query
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