Invention Grant
- Patent Title: Processing method for substrate having metal exposed
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Application No.: US16050068Application Date: 2018-07-31
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Publication No.: US10535563B2Publication Date: 2020-01-14
- Inventor: Makiko Ohmae
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2017-153170 20170808
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L23/373 ; H01L23/14

Abstract:
A processing method for a substrate having a metal exposed and having cutting lines of a predetermined width set thereon includes: a structural body disposing step of disposing two structural bodies on the metal along respective edges in regard of the width direction of the cutting line, with a gap corresponding to the width therebetween; and a cutting step of causing a cutting blade to cut into the substrate from between the two structural bodies to cut the substrate along the cutting lines, after the structural body disposing step is carried out.
Public/Granted literature
- US20190051560A1 PROCESSING METHOD FOR SUBSTRATE HAVING METAL EXPOSED Public/Granted day:2019-02-14
Information query
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