Invention Grant
- Patent Title: Integrated passive device and fabrication method using a last through-substrate via
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Application No.: US15813710Application Date: 2017-11-15
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Publication No.: US10535585B2Publication Date: 2020-01-14
- Inventor: Takashi Noma , Hideyuki Inotsume , Kazuo Okada
- Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Applicant Address: US AZ Phoenix
- Assignee: Semiconductor Components Industries, LLC
- Current Assignee: Semiconductor Components Industries, LLC
- Current Assignee Address: US AZ Phoenix
- Agency: Brake Hughes Bellermann LLP
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/532 ; H01L23/00 ; H01L21/304 ; H01L21/768 ; H01L21/3065 ; H01L21/311 ; H01L21/288 ; H01L21/683 ; H01L21/78 ; H01L23/528 ; H01L49/02

Abstract:
In one general aspect, an integrated passive device (IPD) die includes at least one passive component that is embedded in an insulator material disposed on a front surface of a substrate. The IPD die includes a through-substrate via (TSV) extending from the backside of the substrate toward the front surface of the substrate. The TSV defines interconnect access to at least one passive component embedded in the insulator material disposed on the front surface of the substrate. The substrate has a thickness less than three-quarters of an original thickness of the substrate.
Public/Granted literature
- US20190067164A1 INTEGRATED PASSIVE DEVICE AND FABRICATION METHOD USING A LAST THROUGH-SUBSTRATE VIA Public/Granted day:2019-02-28
Information query
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