Invention Grant
- Patent Title: Method for producing thin-film element device and light irradiation device used therefor
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Application No.: US15556351Application Date: 2016-03-03
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Publication No.: US10535843B2Publication Date: 2020-01-14
- Inventor: Tetsunori Tanaka , Wataru Nakamura , Shoji Okazaki , Masaki Fujiwara
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: Keating & Bennett, LLP
- Priority: JP2015-046694 20150310
- International Application: PCT/JP2016/001182 WO 20160303
- International Announcement: WO2016/143316 WO 20160915
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L51/56 ; B23K26/57 ; H01L51/00 ; H01L27/12 ; H05B33/10 ; H01L21/02 ; B23K26/064 ; H01L51/50 ; B23K101/36

Abstract:
A method includes steps of (a) forming a substrate layer 10 above a support substrate 8 which is transparent, and then a thin-film element above the substrate layer 10; and (b) emitting laser beams La and Lb to a face of the support substrate 8 opposite to another face of the support substrate to which the substrate layer 10 and the thin-film element are formed, and delaminating the substrate layer 10 and the thin-film element from the support substrate 8. In step (b), the laser beams La and Lb are emitted from different directions.
Public/Granted literature
- US20180108874A1 METHOD FOR PRODUCING THIN-FILM ELEMENT DEVICE AND LIGHT IRRADIATION DEVICE USED THEREFOR Public/Granted day:2018-04-19
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