Invention Grant
- Patent Title: Method producing a conductive path on a substrate
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Application No.: US13958043Application Date: 2013-08-02
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Publication No.: US10537027B2Publication Date: 2020-01-14
- Inventor: Zvi Kotler , Michael Zenou
- Applicant: Orbotech Ltd.
- Applicant Address: IL Yavne
- Assignee: Orbotech Ltd.
- Current Assignee: Orbotech Ltd.
- Current Assignee Address: IL Yavne
- Agency: Sughrue Mion, PLLC
- Main IPC: H05K3/02
- IPC: H05K3/02

Abstract:
A method of producing a conductive path on a substrate including depositing on the substrate a layer of material having a thickness in the range of 0.1 to 5 microns, including metal particles having a diameter in the range of 10 to 100 nanometers, employing a patterning laser beam to selectably sinter regions of the layer of material, thereby causing the metal particles to together define a conductor at sintered regions and employing an ablating laser beam, below a threshold at which the sintered regions would be ablated, to ablate portions of the layer of material other than at the sintered regions.
Public/Granted literature
- US20150033557A1 SYSTEM AND METHOD FOR PRODUCING A CONDUCTIVE PATH ON A SUBSTRATE Public/Granted day:2015-02-05
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