Invention Grant
- Patent Title: High heat-resistant polyamic acid solution and polyimide film
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Application No.: US15322957Application Date: 2015-06-30
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Publication No.: US10538665B2Publication Date: 2020-01-21
- Inventor: Woong Ki Min , Hyo Jun Park , Hak Gee Jung , Ki Il Hong
- Applicant: KOLON INDUSTRIES, INC.
- Applicant Address: KR Seoul
- Assignee: KOLON INDUSTRIES, INC.
- Current Assignee: KOLON INDUSTRIES, INC.
- Current Assignee Address: KR Seoul
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2014-0081403 20140630; KR10-2015-0091870 20150629
- International Application: PCT/KR2015/006666 WO 20150630
- International Announcement: WO2016/003146 WO 20160107
- Main IPC: C08G73/10
- IPC: C08G73/10 ; C08L79/08 ; C08J5/18

Abstract:
This invention relates to a highly heat-resistant polyamic acid solution and a polyimide film having improved thermal dimensional stability, wherein the polyamic acid solution includes a polymer of a diamine compound, containing 1 to 10 mol % of a carboxylic acid functional group-containing diamine compound based on the total amount of diamine, and a dianhydride compound, and the polyimide film includes polyimide, which is an imidized product of the polyamic acid solution and is configured such that main chains thereof are crosslinked through an amide bond (—CONH—).
Public/Granted literature
- US20170233575A1 HIGH HEAT-RESISTANT POLYAMIC ACID SOLUTION AND POLYIMIDE FILM Public/Granted day:2017-08-17
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