Invention Grant
- Patent Title: Vaporizer and thin film deposition apparatus including the same
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Application No.: US15385006Application Date: 2016-12-20
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Publication No.: US10538843B2Publication Date: 2020-01-21
- Inventor: Hyun-Sik Sim , Jung-Suk Oh , Jae-Seok Kim , Ho-Gon Kim , Jun-Won Lee , Hyuk-Yul Choi , Hyung-Ho Kim , Sang-Jin Choi , Heok-Jae Lee , Dong-Ok Shin , Jang-Hyoun Youm , Ichiro Nishikawa , Masanori Terasaka , Masashi Hamada , Tae-Hoon Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do JP Kyoto
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,HORIBA STEC, CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,HORIBA STEC, CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do JP Kyoto
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2016-0019165 20160218
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/44

Abstract:
A vaporizer includes a main body including a first body and a second body. The first body has an upper portion narrowing in a direction of a height of the first body and the second body has a cavity in which the first body is positioned. A mixing chamber is between the first and second bodies. The second body includes a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber. The carrier gas injection path carries a carrier gas. A source material injection path is connected to a source material inlet formed in the mixing chamber. The source material injection path carries a liquid source material. A discharge is connected to an outlet formed in a lower portion of the mixing chamber. A mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path.
Public/Granted literature
- US20170241015A1 VAPORIZER AND THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME Public/Granted day:2017-08-24
Information query
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