Invention Grant
- Patent Title: Method for manufacturing group 13 nitride crystal and group 13 nitride crystal
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Application No.: US15115154Application Date: 2015-02-19
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Publication No.: US10538858B2Publication Date: 2020-01-21
- Inventor: Masahiro Hayashi , Takashi Satoh , Naoya Miyoshi , Junichi Wada , Seiji Sarayama
- Applicant: SCIOCS COMPANY LIMITED
- Applicant Address: JP Ibaraki
- Assignee: SCIOCS COMPANY LIMITED
- Current Assignee: SCIOCS COMPANY LIMITED
- Current Assignee Address: JP Ibaraki
- Agency: Cooper & Dunham LLP
- Priority: JP2014-054540 20140318; JP2014-221791 20141030
- International Application: PCT/JP2015/055494 WO 20150219
- International Announcement: WO2015/141420 WO 20150924
- Main IPC: C30B19/00
- IPC: C30B19/00 ; C30B19/06 ; C30B19/02 ; C30B19/12 ; C30B29/40 ; C30B9/12 ; C30B29/68

Abstract:
In a method for manufacturing a group 13 nitride crystal, a seed crystal made of a group 13 nitride crystal is arranged in a mixed melt containing an alkali metal and a group 13 element, and nitrogen is supplied to the mixed melt to grow the group 13 nitride crystal on a principal plane of the seed crystal. The seed crystal is manufactured by vapor phase epitaxy. At least a part of contact members coming into contact with the mixed melt in a reaction vessel accommodating the mixed melt is made of Al2O3. An interface layer having a photoluminescence emission peak whose wavelength is longer than the wavelength of a photoluminescence emission peak of the grown group 13 nitride crystal is formed between the seed crystal and the grown group nitride crystal.
Public/Granted literature
- US20160348272A1 METHOD FOR MANUFACTURING GROUP 13 NITRIDE CRYSTAL AND GROUP 13 NITRIDE CRYSTAL Public/Granted day:2016-12-01
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