Invention Grant
- Patent Title: Pattern manufacturing apparatus, pattern manufacturing method, and pattern manufacturing program
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Application No.: US15681720Application Date: 2017-08-21
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Publication No.: US10539885B2Publication Date: 2020-01-21
- Inventor: Eiji Oshima
- Applicant: KANTATSU CO., LTD.
- Applicant Address: JP Yaita-shi
- Assignee: KANTATSU CO., LTD.
- Current Assignee: KANTATSU CO., LTD.
- Current Assignee Address: JP Yaita-shi
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2016-186394 20160926
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/38 ; G03F7/34

Abstract:
A pattern forming photo-curing layer is heated, thereby enabling quick shaping. A pattern manufacturing apparatus (100) includes a controller (101), a laser projector (102), and a heater (103). The controller (101) controls the laser projector (102) to form a pattern on a pattern forming sheet (130) placed on a stage (140). The laser projector (102) includes an optical engine (121), and the controller (101) controls the laser projector (102) to irradiate the pattern forming sheet (130) with a light beam from the optical engine (121). The heater (103) heats the pattern forming sheet (130).
Public/Granted literature
- US20180088471A1 PATTERN MANUFACTURING APPARATUS, PATTERN MANUFACTURING METHOD, AND PATTERN MANUFACTURING PROGRAM Public/Granted day:2018-03-29
Information query
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