Invention Grant
- Patent Title: Image analysis useful for patterned objects
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Application No.: US14530299Application Date: 2014-10-31
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Publication No.: US10540783B2Publication Date: 2020-01-21
- Inventor: John S. Vieceli , Stephen Tanner , John A. Moon , M. Shane Bowen
- Applicant: Illumina, Inc.
- Applicant Address: US CA San Diego
- Assignee: ILLUMINA, INC.
- Current Assignee: ILLUMINA, INC.
- Current Assignee Address: US CA San Diego
- Agency: Fletcher Yoder P.C.
- Main IPC: G06T7/73
- IPC: G06T7/73

Abstract:
Embodiments for registering features in a repeating pattern are described. These embodiments can include providing an object having a repeating pattern of features and a fiducial. These embodiment can also include obtaining a target image of the object, where the target image includes the repeating pattern of features and the fiducial. These embodiment can also include comparing the fiducial in the target image to reference data, where the reference data includes xy coordinates for a virtual fiducial. These embodiment can also include determining locations for the features in the target image based on the comparison of the virtual fiducial in the reference data to the fiducial in the data from the target image. The fiducial can have at least concentric circles that produce three different signal levels. The locations of the features can be determined at a variance of less than 5 μm.
Public/Granted literature
- US20150125053A1 IMAGE ANALYSIS USEFUL FOR PATTERNED OBJECTS Public/Granted day:2015-05-07
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