Invention Grant
- Patent Title: Semiconductor device comprising a trench structure
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Application No.: US15951642Application Date: 2018-04-12
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Publication No.: US10541327B2Publication Date: 2020-01-21
- Inventor: Joachim Weyers , Franz Hirler
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102017108048 20170413
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/02 ; H01L27/06 ; H01L29/66 ; H01L29/866

Abstract:
A semiconductor device includes a trench structure extending into a semiconductor body from a first surface. The trench structure has a shield electrode, a dielectric structure and a diode structure. The diode structure is arranged at least partly between the first surface and a first part of the dielectric structure. The shield electrode is arranged between the first part of the dielectric structure and a bottom of the trench structure. The shield electrode and the semiconductor body are electrically isolated by the dielectric structure. Corresponding methods of manufacture are also described.
Public/Granted literature
- US20180301553A1 Semiconductor Device Comprising a Trench Structure Public/Granted day:2018-10-18
Information query
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