Invention Grant
- Patent Title: Cleaning of nanostructures
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Application No.: US15463383Application Date: 2017-03-20
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Publication No.: US10543515B2Publication Date: 2020-01-28
- Inventor: Pio Peter Niraj Nirmalraj
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Daniel Morris
- Main IPC: B08B6/00
- IPC: B08B6/00 ; C01B21/064 ; B08B3/08 ; B82B3/00

Abstract:
The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.
Public/Granted literature
- US20180071797A1 CLEANING OF NANOSTRUCTURES Public/Granted day:2018-03-15
Information query
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