Invention Grant
- Patent Title: Wafer alignment with restricted visual access
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Application No.: US15702584Application Date: 2017-09-12
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Publication No.: US10543564B2Publication Date: 2020-01-28
- Inventor: Thomas Pass
- Applicant: SUNPOWER CORPORATION
- Applicant Address: US CA San Jose
- Assignee: SunPower Corporation
- Current Assignee: SunPower Corporation
- Current Assignee Address: US CA San Jose
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L21/68 ; H01L21/67 ; B23K26/03 ; G03F9/00

Abstract:
Wafer alignment with restricted visual access has been disclosed. In an example, a method of processing a substrate for fabricating a solar cell involves supporting the substrate over a stage. The method involves forming a substantially opaque layer over the substrate. The substantially opaque layer at least partially covers edges of the substrate. The method involves performing fit-up of the substantially opaque layer to the substrate. The method involves illuminating the covered edges of the substrate with light transmitted through the stage, and capturing a first image of the covered edges of the substrate based on the light transmitted through the stage. The method further includes determining a first position of the substrate relative to the stage based on the first image of the covered edges. The substrate may be further processed based on the determined first position of the substrate under the substantially opaque layer.
Public/Granted literature
- US20180001420A1 WAFER ALIGNMENT WITH RESTRICTED VISUAL ACCESS Public/Granted day:2018-01-04
Information query
IPC分类: