Invention Grant
- Patent Title: Integrated circuit (IC) devices including cross gate contacts
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Application No.: US15473913Application Date: 2017-03-30
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Publication No.: US10546855B2Publication Date: 2020-01-28
- Inventor: Rajeev Ranjan , Deepak Sharma , Subhash Kuchanuri , Chul Hong Park , Jae Seok Yang , Kwan Young Chun
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Priority: KR10-2016-0124898 20160928
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L23/528 ; H01L27/02 ; H01L29/06 ; H01L27/092 ; H01L23/522

Abstract:
Integrated circuit devices are provided. The IC devices may include an active region extending in a first direction, first and second gate electrodes extending in a second direction, a first impurity region in the active region adjacent a first side of the first gate electrode, a second impurity region in the active region between a second side of the first gate electrode and a first side of the second gate electrode, a third impurity region in the active region adjacent a second side of the second gate electrode, a cross gate contact electrically connecting the first and second impurity regions, a first contact electrically connected to the third impurity region, a first wire electrically connected to the cross gate contact, and a second wire electrically connected to the first contact. The first and second wires may extend only in the first direction and may be on the same line.
Public/Granted literature
- US20180090492A1 INTEGRATED CIRCUIT (IC) DEVICES INCLUDING CROSS GATE CONTACTS Public/Granted day:2018-03-29
Information query
IPC分类: