Invention Grant
- Patent Title: Variable resistance memory device and method of manufacturing the same
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Application No.: US16014871Application Date: 2018-06-21
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Publication No.: US10547000B2Publication Date: 2020-01-28
- Inventor: Ji-Hyun Jeong , Ilmok Park , Si-Ho Song
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2017-0136297 20171020
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00 ; G11C13/00

Abstract:
Disclosed are a variable resistance memory device and a method of manufacturing the same. The device comprises a first conductive line extending in a first direction, a second conductive line extending in a second direction intersecting the first direction, a memory cell at an intersection between the first conductive line and the second conductive line, a first electrode between the first conductive line and the memory cell, and a second electrode between the second conductive line and the memory cell. The memory cell comprises a switching pattern, an intermediate electrode, a first resistivity control pattern, and a variable resistance pattern that are connected in series between the first conductive line and the second conductive line. Resistivity of the first resistivity control pattern is less than resistivity of the second electrode.
Public/Granted literature
- US20190123272A1 VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-04-25
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