Invention Grant
- Patent Title: Deposition apparatus
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Application No.: US15429740Application Date: 2017-02-10
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Publication No.: US10547003B2Publication Date: 2020-01-28
- Inventor: Jae Wan Park , Ju Eel Mun , Seung Ki Kang , In Hyun Hwang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Cantor Colburn LLP
- Priority: KR10-2016-0088199 20160712
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L51/00 ; C23C14/24 ; C23C14/54 ; H01L21/67 ; H01L21/66 ; H01L51/56

Abstract:
A deposition apparatus includes a chamber, a first stage and a second stage for supporting substrates within the chamber, an evaporating source assembly moving a first stage area corresponding to the first stage and a second stage area corresponding to the second stage, and including a plurality of nozzles through which a source material is spurted, and a photographing assembly which is disposed between the first stage and the second stage and photographs the plurality of nozzles.
Public/Granted literature
- US20180019395A1 DEPOSITION APPARATUS Public/Granted day:2018-01-18
Information query
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