Invention Grant
- Patent Title: Manufacturing device of organic semiconductor film
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Application No.: US16041769Application Date: 2018-07-21
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Publication No.: US10549311B2Publication Date: 2020-02-04
- Inventor: Seigo Nakamura , Yoshiki Maehara , Yuichiro Itai , Yoshihisa Usami , Junichi Takeya
- Applicant: FUJIFILM Corporation , THE UNIVERSITY OF TOKYO
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: FUJIFILM Corporation,THE UNIVERSITY OF TOKYO
- Current Assignee: FUJIFILM Corporation,THE UNIVERSITY OF TOKYO
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2016-019102 20160203
- Main IPC: B05C11/04
- IPC: B05C11/04 ; H01L51/00 ; H01L51/05 ; H01L51/10 ; H01L51/56 ; H01L27/12 ; B05C5/02 ; H01L29/786 ; B05C5/00

Abstract:
A device for manufacturing an organic semiconductor film, including a coating member disposed to face a substrate surface while spaced therefrom for forming the film, and forming a liquid reservoir of an organic semiconductor solution between the coating member and the substrate; a supply portion that supplies the solution; and a cover portion that covers at least a crystal growth portion of the solution. The cover portion includes a guide that guides a deposit formed of an evaporated solvent of the solution to a film-unformed region of the organic semiconductor film. While the solution is supplied between the coating member and the substrate surface by the supply portion, the coating member is moved in a first direction parallel to the substrate surface in a state of being in contact with the solution, to form the film with the crystal growth portion as a starting point.
Public/Granted literature
- US20180326447A1 MANUFACTURING DEVICE OF ORGANIC SEMICONDUCTOR FILM Public/Granted day:2018-11-15
Information query
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