Invention Grant
- Patent Title: Method for producing purified active silicic acid solution and silica sol
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Application No.: US15205571Application Date: 2016-07-08
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Publication No.: US10550300B2Publication Date: 2020-02-04
- Inventor: Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
- Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2011-203170 20110916
- Main IPC: C09K3/14
- IPC: C09K3/14 ; C09K13/04 ; C01B33/143 ; C01B33/148 ; C01B33/141

Abstract:
A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition; the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.
Public/Granted literature
- US20160319173A1 METHOD FOR PRODUCING PURIFIED ACTIVE SILICIC ACID SOLUTION AND SILICA SOL Public/Granted day:2016-11-03
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