Invention Grant
- Patent Title: Physical vapor deposition method using backside gas cooling of workpieces
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Application No.: US15921030Application Date: 2018-03-14
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Publication No.: US10550464B2Publication Date: 2020-02-04
- Inventor: Ravi Mullapudi , Harish Varma Penmethsa , Harshal T. Vasa , Srikanth Dasaradhi , Lee LaBlanc
- Applicant: Tango Systems, Inc.
- Applicant Address: US CA San Jose
- Assignee: Tango Systems, Inc.
- Current Assignee: Tango Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Patent Law Group
- Agent Brian D. Ogonowsky
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/50 ; C23C14/54 ; H01J37/34 ; H01J37/32

Abstract:
A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
Public/Granted literature
- US20180202040A1 PHYSICAL VAPOR DEPOSITION METHOD USING BACKSIDE GAS COOLING OF WORKPIECES Public/Granted day:2018-07-19
Information query
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