Invention Grant
- Patent Title: Methods for providing lithography features on a substrate by self-assembly of block copolymers
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Application No.: US14419212Application Date: 2013-07-26
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Publication No.: US10551736B2Publication Date: 2020-02-04
- Inventor: Jozef Maria Finders , Tamara Druzhinina , Emiel Peeters , Sander Frederik Wuister , Christianus Martinus Van Heesch , Eddy Cornelis Antonius Van Der Heijden , Henri Marie Joseph Boots
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/065824 WO 20130726
- International Announcement: WO2014/023589 WO 20140213
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/00

Abstract:
A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.
Public/Granted literature
- US20150205197A1 METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS Public/Granted day:2015-07-23
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