Invention Grant
- Patent Title: Thin film inductor and method of manufacturing the same
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Application No.: US15634523Application Date: 2017-06-27
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Publication No.: US10553346B2Publication Date: 2020-02-04
- Inventor: Joung Gul Ryu
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2016-0144644 20161101
- Main IPC: H01F27/24
- IPC: H01F27/24 ; H01F27/28 ; H01F27/32 ; H01F41/02 ; H01F41/04

Abstract:
A method of manufacturing a thin film inductor includes preparing a carrier film having a first surface on which a first upper separation layer is formed and a second surface on which a first lower separation layer is formed. A first upper layer, including a first upper coil pattern and a first upper insulating pattern, is formed on the first surface. A first lower layer, including a first lower coil pattern and a first lower insulating pattern, is formed on the second surface. A surface of the first upper layer is ground. A height of the first lower coil pattern is smaller than that of the first lower insulating pattern.
Public/Granted literature
- US20180122554A1 THIN FILM INDUCTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-05-03
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