Invention Grant
- Patent Title: Processing method for wafer
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Application No.: US15900247Application Date: 2018-02-20
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Publication No.: US10553490B2Publication Date: 2020-02-04
- Inventor: Hiroshi Morikazu , Noboru Takeda
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain Ltd.
- Priority: JP2017-030025 20170221
- Main IPC: H01L21/304
- IPC: H01L21/304 ; H01L21/78 ; H01L21/687 ; G01N29/06

Abstract:
A processing method for a wafer including a crack detection step for irradiating illumination of a wavelength transparent to wafer, picking up an image of the wafer, and detecting whether a crack is generated within the wafer, a crack direction verification step for verifying, when a crack is detected, to which one of the first and second directions a direction in which the crack extends is nearer, a first cutting step for positioning the cutting blade to a scheduled division line of a direction decided to be a direction farther from the direction in which the crack extends from between the first and second directions and cutting the scheduled division line, and next a second cutting step for positioning the cutting blade to a scheduled division line of a direction decided to be nearer to the direction in which the crack extends and cutting the scheduled division line.
Public/Granted literature
- US20180240708A1 PROCESSING METHOD FOR WAFER Public/Granted day:2018-08-23
Information query
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